Shanghai Duolun Museum of Modern Art
Shanghai, , CN China
The Shanghai Duolun Museum of Modern Art is the first publicly funded contemporary art museum in mainland China. In keeping with its mission to support contemporary art and artists, the Duolun MoMA offers an international artist-in-residence program to bring artists from around the world to the museum to work on individual or collaborative projects proposed by the artists themselves. It is intended to foster personal vision by offering a unique opportunity for working professional artists to expand their art and experience by making contact with Chinese and other international artists while working in the dynamic environment that the city of Shanghai and the Duolun MoMA provide.
The residence program operates on an open studio policy, thereby promoting interaction between the resident artist and the Chinese public. During the residency, artists will be asked to run a workshop for the public concerning their project at the Duolun MoMA. Resident artists are given the opportunity to exhibit the successful completion of their project in the Duolun MoMA galleries as the culmination of their residency.
The Duolun MoMA provides resident artists with a studio (including computer with internet connection), a guest apartment (utilities not included), and a stipend of 3000RMB/month for the period of residency. The artist pays for travel expenses and any other costs. The Duolun MoMA will provide a letter of invitation to accepted resident artists in order to apply for a travel grant. The museum will also provide a separate letter of invitation to facilitate the visa application process.
Resident artists are chosen by a board on the basis of their applications. Artists may apply individually or in collaboration with other artists. However, if artists apply for the residency as a group/collaboration, the Duolun MoMA can still only provide one studio, one apartment, and one stipend for the whole group.
In order to apply, please submit:
- application form (download below)**please thoroughly
- describe your proposed project for the residency in this application form
- CV
- documentation of artistic activities (publications, catalogues, reviews, etc)**not required, but recommended if available
- slides, photos, CD rom (PC compatible), DVD, and/or CD of works**no minimum requirement, please submit whatever is necessary to best convey your work
- references: names, addresses, email addresses, and telephone numbers of three people who know your work**letters of recommendation not necessary
Note: Students and amateurs please do not apply. We cannot return application materials.
Please send all application materials to the following address:
Artist-in-Residence Program
Shanghai Duolun Museum of Modern Art
No.27 Duolun Road
HongKou District
Shanghai 200081
China
The deadline for applications is December 10, 2006. This is the date by which all applications must be received in our office, so please allow plenty of time for shipping. Emailed applications cannot be accepted. All applications become the property of the museum and cannot be returned. Results will be announced by early January, and the residency will start on March 1, 2007 and last until May 1, 2007.
E-mail: workshops@duolunart.com
More information can be found at: www.duolunart.com/residence/residence_e.html
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